Nanzhi Institute of Advanced Optoelectronic Integrated Technology

Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology
Nanzhi Institute of Advanced Optoelectronic Integrated Technology

The existing nanofabrication and nano-characterization clean room area exceeds 3000 square meters. The temperature fluctuation range of the thousands-level zone of the clean room can be maintained at ± 0.5 ℃/h, the temperature of the hundred-level zone can be maintained at ± 0.3 ℃/h, and the electron beam lithography zone is ± 0.1 ℃/h. Micro-nano processing clean room equipment contains lithography, dry etching, deposition, characterization and other common micro-nano processing equipment.

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